X-Ray Diffuse Scattering from Self-Organized Mesoscopic Semiconductor Structures

Specificaties
Gebonden, 204 blz. | Engels
Springer Berlin Heidelberg | 2004e druk, 2004
ISBN13: 9783540201793
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Springer Berlin Heidelberg 2004e druk, 2004 9783540201793
Onderdeel van serie Springer Tracts in Modern Physics
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Samenvatting

This monograph represents a critical survey of the outstanding capabilities of X-ray
diffuse scattering for the structural characterization of mesoscopic material systems. The mesoscopic regime comprises length scales ranging from a few up to some hundreds of nanometers. It is of particular relevance at semiconductor layer systems where, for example, interface roughness or low-dimensional objects such as quantum dots and quantum wires have attracted much interest. An extensive overview of the present state-of-the-art theory of X-ray diffuse scattering at mesoscopic structures is given followed by a valuable description of various experimental techniques. Selected up-to-date examples are discussed. The aim of the present book is to combine aspects of self-organized growth of mesoscopic structures with corresponding X-ray diffuse scattering experiments.

Specificaties

ISBN13:9783540201793
Taal:Engels
Bindwijze:gebonden
Aantal pagina's:204
Uitgever:Springer Berlin Heidelberg
Druk:2004

Inhoudsopgave

A Brief Introduction to the Topic.- Basic Principles of X-Ray Diffuse Scattering on Mesoscopic Structures.- Experimental Optimization.- A Model System: LPE SiGe/Si(001) Islands.- Dynamical Scattering at Grazing Incidence.- Characterization of Quantum Dots.- Characterization of Interface Roughness.- Appendix.

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        X-Ray Diffuse Scattering from Self-Organized Mesoscopic Semiconductor Structures